File:20 nm width stochastic failure probability.png

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Summary

Description
English: The probability of stochastic failure is plotted vs. pitch for 20 nm space widths at an EUV dose of ~30 mJ/cm2.[1] Points below 0.5 ppm are extrapolated. When the distance between exposed 20 nm spaces exceeds about 25-30 nm, the failure probability starts to increase. There is a contribution from secondary electron straggling in the ~20 nm range.[2]
Date
Source Excel
Author Guiding light

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The original description page was here. All following user names refer to en.wikipedia.
Date/Time Dimensions User Comment
2018-10-21 00:57:28 481 × 288 Guiding light
2018-10-20 16:14:10 481 × 288 Guiding light
2018-10-20 15:32:55 481 × 287 Guiding light
2018-10-20 13:36:11 481 × 288 Guiding light Uploading a self-made file using [[Wikipedia:File_Upload_Wizard|File Upload Wizard]]

References

  1. ↑ P. De Bisschop and E. Hendrickx, Proc. SPIE 10583, 105831K (2018).
  2. ↑ A. N. Broers, IEEE Trans. Elec. Dev. 28, 1268 (1981).

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20 October 2018

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Date/TimeThumbnailDimensionsUserComment
current17:49, 23 February 2019Thumbnail for version as of 17:49, 23 February 2019480 × 288 (10 KB)Guiding lightx-axis range
17:45, 23 February 2019Thumbnail for version as of 17:45, 23 February 2019479 × 288 (8 KB)Guiding lightLimited to 20 nm
14:18, 15 December 2018Thumbnail for version as of 14:18, 15 December 2018481 × 288 (10 KB)I love rpgsTransferred from en.wikipedia (MTC!) (1.1.0)
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