File:Different multipatterning techniques.png

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English: Top: When two features must maintain a minimum distance, they may need to be split up onto different masks (indicated by different colors). Center: By applying self-aligned patterning with a spacer (not shown), fewer masks can be used. Moreover, the leftover gap between spacers may pattern additional features. Bottom: A cut mask uses an opposite polarity feature to separate features that were previously part of one shape.
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This diagram was created with Microsoft Excel.
Author Guiding light

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References

1. US Patent 8312394, assigned to Synopsys.
2. US Patent 9177797, assigned to TSMC.
3. A. Malika et al., Proc. SPIE 9048, 90481R (2014).
4. R. Baert et al., IITC/MAM 2015.

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20 October 2018

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Date/TimeThumbnailDimensionsUserComment
current00:11, 5 January 2020Thumbnail for version as of 00:11, 5 January 2020767 × 1,277 (27 KB)Guiding lightput missing spacer label
13:22, 4 January 2020Thumbnail for version as of 13:22, 4 January 2020769 × 1,277 (27 KB)Guiding lightadd cut label
10:05, 4 January 2020Thumbnail for version as of 10:05, 4 January 2020769 × 1,277 (26 KB)Guiding lightsmall drawing correction
09:51, 4 January 2020Thumbnail for version as of 09:51, 4 January 2020769 × 1,277 (26 KB)Guiding lightre-label LE3 as LELELE
09:23, 4 January 2020Thumbnail for version as of 09:23, 4 January 2020769 × 1,277 (27 KB)Guiding lightSmall drawing correction
09:20, 4 January 2020Thumbnail for version as of 09:20, 4 January 2020769 × 1,277 (27 KB)Guiding lightNew example including LE3
11:57, 6 November 2019Thumbnail for version as of 11:57, 6 November 2019479 × 871 (11 KB)Guiding lightlabel corrections
00:45, 6 November 2019Thumbnail for version as of 00:45, 6 November 2019369 × 652 (6 KB)Guiding light
00:44, 6 November 2019Thumbnail for version as of 00:44, 6 November 2019369 × 652 (6 KB)Guiding light
00:43, 6 November 2019Thumbnail for version as of 00:43, 6 November 2019369 × 652 (6 KB)Guiding light
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