File:Isolation pitch vs design rule.PNG

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Isolation_pitch_vs_design_rule.PNG ‎(618 × 400 pixels, file size: 12 KB, MIME type: image/png)

The graph is based directly on data (presented at five IEDM conferences) from Intel process technology from the 180 to 32 nm nodes.[1][2][3][4][5][6]

References[edit]

  1. ^ S. Yang et al., IEDM 1998.
  2. ^ S. Tyagi et al., IEDM 2000.
  3. ^ S. Thompson et al., IEDM 2002.
  4. ^ P. Bai et al., IEDM 2004.
  5. ^ K. Mistry et al., IEDM 2007.
  6. ^ S. Natarajan et al., IEDM 2008.

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Date/TimeThumbnailDimensionsUserComment
current05:12, 24 March 2009Thumbnail for version as of 05:12, 24 March 2009618 × 400 (12 KB)Naturalion (talk | contribs)Reverted to version as of 05:00, 24 March 2009
05:06, 24 March 2009Thumbnail for version as of 05:06, 24 March 2009618 × 400 (12 KB)Naturalion (talk | contribs)
05:00, 24 March 2009Thumbnail for version as of 05:00, 24 March 2009618 × 400 (12 KB)Naturalion (talk | contribs)pitch vs. node
05:29, 9 January 2009Thumbnail for version as of 05:29, 9 January 2009618 × 400 (9 KB)Naturalion (talk | contribs)
05:14, 9 January 2009Thumbnail for version as of 05:14, 9 January 2009618 × 400 (9 KB)Naturalion (talk | contribs)
05:39, 8 September 2008Thumbnail for version as of 05:39, 8 September 2008640 × 400 (10 KB)Naturalion (talk | contribs)

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