Jump to content

Center for Advanced Materials, University of Houston

Coordinates: 29°43′22″N 95°20′43″W / 29.72266°N 95.34514°W / 29.72266; -95.34514
From Wikipedia, the free encyclopedia
(Redirected from Space Vacuum Epitaxy Center)

The Center for Advanced Materials, formerly the Space Vacuum Epitaxy Center, is a laboratory established in 1986 at the University of Houston for researching the science and application of advanced materials. It is hosted in 8,000 square feet (740 m2) of space in three buildings on the Houston campus. Its facilities contain equipment dedicated to thin-film deposition, processing and characterization of III-V compound semiconductors, high-temperature superconductivity, and ferroelectric oxide material systems. The Wake Shield Facility was developed at this center.[1]

See also

[edit]

References

[edit]
  1. ^ "Wake Shield Facility Project". uh.edu. Retrieved 2024-01-31.
[edit]

29°43′22″N 95°20′43″W / 29.72266°N 95.34514°W / 29.72266; -95.34514