File:Schematic illustration of atomic layer deposition.tif
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Summary
| Description |
English: Schematic illustration of one reaction cycle of the atomic layer deposition (ALD) process, using the trimethylaluminium (TMA) - water ALD process to make thin aluminium oxide films as example. Here, the starting surface contains hydroxyls (OH groups) as reactive sites. Step 1 is the reaction of TMA, Step 2 is a purge or evacuation step, Step 3 is the reaction of water, and Step 4 is a purge or evacuation step. This scheme has been first published by Cremers, Puurunen and Dendooven in Applied Physics Reviews, vol. 6, art. 021302, year 2019; https://doi.org/10.1063/1.5060967, Copyright 2019 Authors, licensed under a Creative Commons Attribution (CC BY) 4.0 license. |
| Date | |
| Source | Own work |
| Author | Véronique Cremers, Riikka Puurunen, Jolien Dendooven |
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 06:09, 7 December 2019 |  | 2,008 × 5,905 (4.2 MB) | Rlpuu | User created page with UploadWizard |
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